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kw.\*:("NITRURE TANTALE")

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Results 1 to 13 of 13

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THERMAL OXIDATION AND RESISTIVITY OF TANTALUM NITRIDE FILMSBRADY DP; FUSS FN; GERSTENBERG D et al.1980; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1980; VOL. 66; NO 3; PP. 287-302; BIBL. 13 REF.Article

REALISATION D'UN BATI DE PULVERISATION CATHODIQUE AUTOMATIQUE A HAUTE CAPACITE POUR LA FABRICATION DE CIRCUITS INTEGRES HYBRIDES. OPTIMISATION DES PARAMETRES DE FONCTIONNEMENTJOLY M; MARECHAL M.1972; VIDE; FR.; DA. 1972; NO 158, SUPPL; PP. 8-14; BIBL. 2 REF.Serial Issue

TEMPERATURABHAENGIKEIT DES HALLEFFEKTES UND DER BEWEGLICHKEIT DUENNER AUFGESTAEUBTER TANTALSCHICHTEN. = VARIATION AVEC LA TEMPERATURE DE L'EFFET HALL ET DE LA MOBILITE DES COUCHES MINCES DE TANTALERACHMANN J; JUERGENS W.1975; THIN SOLID FILMS; NETHERL.; DA. 1975; VOL. 26; NO 2; PP. 305-310; ABS. ANGL.; BIBL. 13 REF.Article

ALGORITHMIC TRIMMING ON ACTIVE CIRCUITRY.FABER ML JR.1974; I.E.E.E. TRANS. PARTS HYBR. PACKAG.; U.S.A.; DA. 1974; VOL. 10; NO 3; PP. 169-174; BIBL. 1 REF.; (ELECTRON. COMPONENTS CONF.; WASHINGTON; 1974)Conference Paper

IMPROVEMENT OF TANTALUM NITRIDE RESISTOR FILM STABILITY THROUGH ANALYSIS ON PLATEAU PHENOMENANAKAMURA M; FUJIMORI M; NISHIMURA Y et al.1973; JAP. J. APPL. PHYS.; JAP.; DA. 1973; VOL. 12; NO 1; PP. 30-39; BIBL. 9 REF.Serial Issue

HC2-ANISOTROPY IN TAN SINGLE CRYSTALSWEBER HW; SEIDL E; KIRSCHENHOFER G et al.1978; SOLID STATE COMMUNIC.; GBR; DA. 1978; VOL. 26; NO 11; PP. 795-799; BIBL. 16 REF.Article

PREPARATION AND COMPOSITIONAL ANALYSIS OF SPUTTERED TAN FILMSREICHELT K; NELLEN W; MAIR G et al.1978; J. APPL. PHYS.; USA; DA. 1978; VOL. 49; NO 10; PP. 5284-5287; BIBL. 12 REF.Article

THE ELECTRICAL PROPERTIES OF RESISTIVE AND DIELECTRIC THIN FILMS PREPARED BY REACTIVE SPUTTERING FROM A TANTALUM-TITANIUM COMPOSITE TARGETUMEZAWA T; YAJIMA S; MATSUMOTO K et al.1978; THIN SOLID FILMS; NLD; DA. 1978; VOL. 52; NO 1; PP. 69-75; BIBL. 4 REF.Article

SUPERCONDUCTING PROPERTIES OF TA-N.DE LILLO S; MANCINI F.1976; PHYS. LETTERS, A; NETHERL.; DA. 1976; VOL. 59; NO 4; PP. 297-298; BIBL. 8 REF.Article

DETERMINATION OF THE RELATIVE NITROGEN DOPING LEVEL OF TANTALUM NITRIDE RESISTOR FILM BY MEANS OF THE SEEBECK EFFECTTRUDEL ML.1972; I.E.E.E. TRANS. PARTS HYBR. PACKAG.; U.S.A.; DA. 1972; VOL. 8; NO 3; PP. 16-21; BIBL. 4 REF.Serial Issue

A NEW CENTER-TAPPED MEDIUM-POWER MICROFILM RESISTOR.BOS LW; OSTRANDER WJ; VER HOF J et al.1976; I.E.E.E. TRANS. PARTS HYBR. PACKAG.; U.S.A.; DA. 1976; VOL. 12; NO 3; PP. 212-217; BIBL. 1 REF.Article

THIN-FILM CAPACITORS MADE FROM TA N FILMSDOKEN M; OHWADA K; OKAMOTO S et al.1978; E.E.E.E. TRANS. COMPON. HYBR. MANUFG TECHNOL.; USA; DA. 1978; VOL. 1; NO 2; PP. 187-191; BIBL. 4 REF.Article

INFLUENCE DU PLASMA SUR LA STRUCTURE DES COUCHES MINCES DE TANTALE OBTENUES PAR PULVERISATION CATHODIQUE.COLLOBERT D.1975; ; S.L.; DA. 1975; PP. (225P.); BIBL. 21 P. 1/2; (THESE DOCT. 3E CYCLE, SPEE. PHYS. GAZ PLASMAS; PARIS SUD)Thesis

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